Compact EUV & X-ray Light Sources Workshop
This year’s International Workshop on Compact EUV & X-ray Light Sources located in lovely Maastricht, Netherlands has come to a successful conclusion with the attendees anxiously anticipating next year’s brand new Topical meeting.
This program, which began as an Incubator meeting in 2013, with a follow-up workshop last October was once again collocated with the International Symposium on Extreme Ultraviolet Lithography. This year’s program built upon the previous meetings with the goal of facilitating communications between source developers and end users, disseminating information on currently available sources, and understanding application-based performance targets for future sources.
This year, the participants dove into applications and source technologies and provided an opportunity for an open-mic pitch session. The participants also broke into small groups to further discuss three topics they identified for additional exploration: wafer & mask metrology sources; one kilowatt and beyond EUV lithography sources and bio-medical applications.
New OSA Topical Meeting
This meeting will evolve again in 2016. In March, OSA launches the new OSA High-Brightness Sources and Light-Driven Interactions Congress in Long Beach, CA, USA. At this congress, the new Compact (EUV & X-ray) Light Sources topical meeting will join High-Intensity Lasers and High-Field Phenomena (HILAS) and Mid-Infrared Coherence Sources (MICS). The goal of this new Optics and Photonics Congress is to bring these communities together to report on the latest advances in high-brightness sources, attosecond science, light-driven interactions, advances in mid-IR laser technologies, and to understand the technical challenges in the development of high-brightness sources at all wavelengths, from X-ray to Mid-IR. The Compact Light Topical Meeting will have an added focus on providing an opportunity for industry to highlight technological challenges to the university and national laboratory attendees.