Bragg Gratings, Photosensitivity and Poling in Optical Materials and Waveguides (BGPP)

28 July – 01 August 2024 | Québec City, Québec, Canada

GPP addresses all aspects of electromagnetic or light interactions for traditional, novel glassy or crystalline material and device processing, including additive manufacturing, laser written devices, waveguide processing and poling in optical materials, from physical fundamentals, properties and fabrication approaches to applications across industries.

As new research directions come online, the application of light-matter interactions expands, with recent demands including light-based additive manufacturing methods for fiber and waveguides. The technical program is tailored for informal exchanges, forming new partnerships and reconnecting with colleagues. Attendees come from around the world to participate in this exchange of knowledge.

The meeting topics are divided into three main themes:

1. Fundamentals of light-matter interactions, glassy and crystalline material processing and poling
2. Properties of light-written and poled structures and techniques used in their fabrication
3. Applications of light-written structured and poled devices

Topics
 

Bragg Gratings, Photosensitivity and Poling in Optical Materials and Waveguides (BGPP)

BGPP continues to be a popular meeting for covering state-of-the-art advances in light-matter interactions in optical materials such as fiber, waveguide and gratings in a relaxed and non-pressured atmosphere. This year, the BGPP meeting will celebrate the International year of glass given its prominent role in many of our research. As new directions of research come online, the application of light matter interactions expands, with recent directions including light based additive manufacturing methods for fiber and waveguides. The program is tailored for informal exchanges, forming new partnerships, and reconnecting with colleagues. Attendees come from around the world to participate in this exchange of knowledge. The meeting topics are divided into three main themes: 

1. Fundamentals of light-matter interactions, glassy and crystalline material processing and poling
   Photon-matter interactions (from below the UV to beyond the infrared, from single photon to multi-photon), the similarity between single and multiphoton processing, ablation regimes, optically induced plasmas and nanostructures, defects, densification, stress, phase transitions, transient index changes, optical invisibility, regeneration, annealing, radiation resistance, special fibers and waveguides processing, 3D printing of glass preform, hybrid and organic photonic platforms, optical localization, solid-state autocatalysis, linear and nonlinear behavior. Novel fabrication methods such as additive manufacturing and other processes are also explored.
2. Properties of light-written structures and techniques used in their fabrication
   Temperature and strain performance, holographic writing and additive manufacture, point-by-point inscription, phase front tuning, new writing methods, short pitch gratings, long pitch gratings, volume gratings, random gratings, transient properties, non-linear properties, new poling methods, new materials for poling, new materials for waveguides or gratings, new materials for non-linear applications, radiation properties, annealing properties, long term stability, chemical properties, biomedical compatibility, electromagnetic proof.
    
3. Industrial standardization and applications of light written structured and poled devices.
   Harsh environmental applications, biomedical applications, diagnostics, structural health monitoring, intelligent networks, telecommunications devices, lasers, sensors, high intensity optical field applications, space applications, switching, routing, instrumentation, interrogation, oil and gas applications, industrial field trials, qualifications, international standards and standardization for different industries and applications, nuclear applications, new industry applications, supercontinuum generation, packaging.

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Chairs

Martin Bernier

 Université Laval, Canada, 
 Chair 

Matthieu Lancry

 Universite Paris-Saclay, France, 
 Chair 

Christophe Caucheteur

 Universite de Mons, Belgium, 
 Program Chair 

Sébastien Loranger

 Polytechnique Montréal, Canada, 
 Program Chair 

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Committee Members

Fundamentals of Photosensitivity and Poling
Francois Courvoisier, FEMTO-ST, France
Marc Dussauze, Université de Bordeaux, France
Takumi Fujiwara, Dept. Applied Physics, Tohoku University, Japan
Lili Hu, Shanghai Institue of Optics & Fine Mech Lib, Japan
Andrey A Lipovskii, St.-Petersburg Polytechnic University, USA
Adriana Morana, Institut d'Optique Lab Hubert Curien, France
Jianrong Zeng Qiu, Zhejiang University, China
Yasuhiko Shimotsuma, Kyoto University, Japan
Javier Solis, Consejo Sup Investigaciones Cientificas, Spain
Razvan Stoian, Universite Jean Monnet, France

Properties of Grating Structure, Poled Devices
Somnath Bandyopadhyay, Fiber Optics and Photonics, CGCRI, India
Garry Berkovic, Soreq Nuclear Research Center, Isreal
Gayathri Bharathan, Indian Institute of Technology Delhi, India
Alex Fuerbach, Macquarie University, Australia
Patrice Mégret, Universite de Mons, Belgium
Francois Ouellette, Chengdu University of Technology, China
Daniel Richter, Institute of Applied Physics, Germany
Salvador Sales, Universitat Politècnica de València, Spain
Peter Smith, University of Southampton, UK
Robert Walker, National Research Council Canada, Canada

Industrial Standardization and Applications
Raja Ahmad, Cisco Systems Inc., USA
Oleg Butov, Kotelnikov IRE RAS, Russia
Carlos Cardozo, Federal University of Technology-Paraná, Brazil
Francesco Chiavaioli, Ist di Fisica Applicata Nello Carrara, Italy
Tianliang Li, Wuhan University of Technology, China
Jose Lopez-Higuera, Universidad de Cantabria, Spain
Ping Lu, OFS Fitel LLC, USA
Chengbo Mou, Shanghai University, China
Remco Nieuwland, Somni Solutions, Netherlands
John Withford, Macquarie University, Australia

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