Compact (EUV & X-Ray) Light Sources
23 March 2022 – 25 March 2022 Kempinski Hotel Corvinus Budapest, Budapest, Hungary
Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.
The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs. At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include the latest development in source technologies and applications in the EUV through hard-ray regime.
The collocation with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MICS) meetings provides a unique opportunity to expand interaction with multidisciplinary groups that shares a broad range of interests and goal.
- EUV through hard-x-ray sources and components
- Compact sources
- Compact Free-electron lasers
- Inverse Compton scattering sources
- Laser and discharge produced plasma sources
- X-ray laser sources
- High-harmonic generation sources
- High power lasers beam diagnostics tools
- Radio frequency cavities, and guns
- Undulators and wigglers (including permanent magnet, short-period microwave and THz undulators, superconducting devices)
- Magnets and multiband achromats
- Vacuum chambers and components
- EUV lithography and mask inspection
- Semiconductor wafer inspection and metrology
- Phase contrast imaging and tomography
- Medical and clinical imaging
- Biological imaging
- Macromolecular crystallography
- Cultural heritage studies
- Non-destructive testing
- Ultrafast and dynamic studies
- Wide field imaging
- Enabling technologies such as optics, detectors, beam wavefront diagnostic tools, and other instruments
- Data acquisition, management, and processing
- Sakura Pascarelli, European XFEL GmbH, Germany
The European XFEL: new science opportunities and first results. Plenary
- Chao Chang, KLA Corporation, United States
Laser Produced Plasma X-Ray Sources for Semiconductor Metrology Keynote
- Andreas Maier, DESY, Germany
Machine Learning Improved Laser-Plasma Acceleration Keynote
- Christopher Barty, University of California Irvine, United States
Ultrabright, MeV-class Laser-Compton System for Medical and Industrial Applications
- Enrico Brunetti, Univ. of Strathclyde
A Coherent Undulator Source Based on Coherent Synchrotron Radiation from Attosecond Electron Bunches Produced by a Laser-plasma Accelerator
- Sandrine Dufrenoy, CEA Saclay, France
Commissioning Experiments on the PW APOLLON laser facility
- Marina Eckermann, European Synchrotron Radiation Facility
X-ray Phase-contrast Tomography as a Tool for 3D Virtual Histology: the Example of Lung Tissue in Severe Cases of Covid-19
- Kwang-Je Kim, Argonne National Laboratory, United States
Realizing Cavity-Based X-ray Free Electron Lasers
- Ruxin Li, SIOM-CAS
Development of Compact XFELs Based on Laser Plasma Accelerators
- Ulf Lundström, Kungliga Tekniska Hogskolan, Sweden
High X-ray Brightness Through Liquid-metal-jet Anodes or Nanofocus Technology
- Dinh Cong Nguyen, Stanford University, United States
Novel Design of a Compact FEL for EUV Lithography
- Lydia Rush, Colorado State University, United States
Extreme Ultraviolet Laser Ablation Mass Spectrometry: A New Tool for Chemical Mapping at the Nanoscale
- Daniel Symes, STFC Rutherford Appleton Laboratory, United Kingdom
EPAC: A New, Advanced Facility for Applications of Laser-driven Accelerators
- Takeo Watanabe, University of Hyogo, Japan
R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV
- Wenbing Yun, Sigray Inc., United States
Applications of High Brightness Lab
- Lahsen Assoufid, Argonne National Laboratory, USA, General Chair
- Patrick Naulleau, Lawrence Berkeley National Laboratory, USA, General Chair
- Jorge Rocca, Colorado State Unuiversity, USA, Program Chair
- Tetsuya Ishikawa, Ricken, Japan, Program Chair
- Marie Emmanuelle Couprie, Synchrotron Soleil, France, Program Chair
- Igor Fomenkov , ASML US LP, United States, USA
- Debbie Gustafson, Energetiq Technology, Inc., USA
- Hans Hertz, Kungliga Tekniska Hogskolan, Sweden
- Bob Hettel, Argonne National Laboratory, USA
- Franz Kaertner, Universität Hamburg , Germany, Germany
- Annie Klisnick, CNRS, France, France
- Kazuhiko Omote, Rigaku Corporation, Japan, Japan
- Zhentang Zhao, Shanghai Institute of Applied Physics, China , China
- François Légaré, INRS, Canada
- Luca Giannessi, rmi, Sincrotrone Trieste, Italy
- Federico Furch, Max Born Institute for Nonlinear, Germany
- Dino Jaroszynski, Scottish Universities Physics Alliance (SUPA), UK
National Institute of Standards & Technology, USA
An Optical Sampling Oscilloscope
I will intorduce the principles of a sampling oscilloscope based on dual optical frequency combs that has bandwidth of 100THz. Applications in precision infrared spectroscopy, microscopy and quantum electric field metrology will be described.
About the Speaker
Scott Diddams is a Fellow of the National Institute of Standards and Technology and Professor at the University of Colorado Boulder, where he carries out experimental research in the fields of precision spectroscopy, nonlinear optics, microwave photonics and ultrafast lasers. He has pioneered the use of optical frequency combs for optical clocks, tests of fundamental physics, novel spectroscopy in the visible and mid-infrared, and ultralow noise frequency synthesis. In recent years, a focus has been on infrared frequency comb sources as well as high repetition rate electro-optic and microresonator frequency combs, which are being explored for applications in spectroscopy, microwave photonics and astronomy. Among many awards, Dr. Diddams received the Department of Commerce gold and silver medals for "revolutionizing the way frequency is measured” as well as the Presidential Early Career Award in Science and Engineering (PECASE) and the IEEE Rabi award. He is a Fellow of Optica and the American Physical Society.
Chang Hee Nam
Gwangju Institute of Science & Technology, South Korea
Ultrahigh Intensity Laser for strong field physics research
Ultrahigh intensity lasers have opened up research opportunities in charged particle acceleration and strong field quantum electrodynamics. By tightly focusing a wavefront-corrected multi-PW laser the record-breaking laser intensity of 1023 W/cm2 was realized at CoReLS.
About the Speaker
Chang Hee Nam received his Ph. D. in plasma physics from Princeton University. After working at Princeton Plasma Physics Laboratory as a staff research physicist, he joined Korea Advanced Institute of Science and Technology (KAIST) and became a full professor in 1998. He established Coherent X-ray Research Center for the investigation of attosecond science. After moving to Gwangju Institute of Science and Technology (GIST) in 2012, he launched the Center for Relativistic Laser Science (CoReLS), a research center of Institute for Basic Science (IBS), for the exploration of strong field physics using femtosecond PW lasers. He is a fellow of American Physical Society and of Optica.
European XFEL, Germany
The European XFEL: new science opportunities and first results
The EuXFEL is the first hard XFEL powered by a superconducting accelerator. Six instruments started user operation between 2017 and 2019. I will report first results from early experiments, and comment on important challenges ahead.
About the Speaker
Sakura Pascarelli received a Laurea in Physics at the University La Sapienza (Rome, Italy) and a PhD degree in Physics at the University Joseph Fourier (Grenoble, France). After joining the European Synchrotron Radiation Facility (ESRF, Grenoble, France) in 1993, her scientific career evolved around the development of methods to probe the local and electronic structure of condensed matter by synchrotron X-rays. In the past twenty years, her main scientific interest was the investigation of matter at extreme conditions of pressure, temperature and magnetic fields using principally X-ray Absorption Spectroscopy and X-ray Magnetic Linear and Circular Dichroism. She was in charge of the x-ray absorption spectroscopy beamlines ID24 (1997-2019) and BM23 (2000-2019), Head of the Electronic Structure and Magnetism Group (2012-2015) and Head of the Matter at Extremes Group (2015-2019). In September 2019 she joined the European XFEL (Hamburg, Germany) as Scientific Director responsible for the development of the scientific program on the four short-waved hard X-ray instruments.
Ultra-high intensity lasers around the world
Tuesday, 22 March 17:00 – 18:00
Join this global panel to learn what to expect from the world’s most high brightness sources in the coming years. Panelists will also discuss how to sign up for experiments, apply for funding, and upcoming research campaigns. Time will be reserved for questions with the panelists.
Constantin Häfner, Fraunhofer Institut für Lasertechnik, Germany
Kramer Akli, Department of Energy, USA
Colin Danson, AWE, UK
Chang Hee Nam, Gwangju Institute of Science & Technology, South Korea
Allen Weeks, ELI, Czechia
Technology Showcase: From EUV to SXR: Next-Gen Metrology and Inspection Sources
Wednesday, 23 March 10:00 – 10:20
Speaker: Bill Solari, Senior Product Manager, EUV, Energetiq Technology
As a leader in extreme ultraviolet (EUV) source development, Energetiq has over 50 sources in the field being used in materials research and high-volume manufacturing applications. Next generation metrology and inspection sources need higher power, higher numerical aperture (NA) and more brightness. Beyond EUV, emerging soft x-ray (SXR) technology is unlocking a small footprint alternative to synchrotrons with a lower cost-of-ownership and higher availability. This showcase will address the challenges of current technology and solutions that will reveal the future of metrology and inspection sources.
Lasers and Free-Electron Lasers Session
Thursday, 24 March 09:00 – 11:00
Conventional lasers and laser based secondary sources as well as Free-Electron Lasers have made tremendous progress over the last decades in terms of key parameters such as pulse duration, average power and energy as well as wavelength coverage. In addition conventional lasers are indispensable tools in advanced Free-Electron Laser facilities and related experiments. This session brings together key players in these areas to review progress and speculate about possibilities for the future given recent advances in both fields.
Franz Kaertner, Universität Hamburg, Germany
Carlo Callegari, FERMI, Italy
AMO Science with a temporally-coherent seeded FEL
Zhirong Huang, Stanford Linear Accelerator Center, USA
High-power, high-brightness X-ray FEL development at LCLS
Heung-Sik Kang, Pohang Accelerator Laboratory, Korea
High brightness XFEL R&D of the PAL-XFEL
Agostino Marinelli, Stanford Linear Accelerator Center, USA
Attosecond pump/probe experiments at the Linac Coherent Light Source
Eiji Takahashi, RIKEN, Japan
High efficiency ultrafast soft x-ray harmonic generation which is a complementary partner to Free Electron Lasers
Kensuke Tono, Japan Synchrotron Radiation Research Institute, Japan
SACLA: XFEL Facility for Scientific Applications
Technology Showcase: Novel Optics for Optimizing the 4th Generation Sychrotron Radiation Facility
Thursday, 24 March 16:30 – 16:50
Speaker: Yoshio Ichii, Ph.D., Group Lead and Senior Manager of Sales Department, JTEC Corporation
We, JTEC Corporation, have manufactured various High-Precision X-ray Mirrors by using EEM, nano-fabrication technology, and RADSI and MSI, nano-measurements derived from the collaboration work between Osaka University and RIKEN SPring8.
Since the start of our fabrication, we have delivered approximately 1,100 high precision X-ray mirrors to facilities worldwide, as of March 2022.
Yoshio Ichii will give an overview of product examples: Super Polished KB mirror; Advanced KB Mirror; Ellipsoidal Mirror; and Deformable Mirror.
Thursday, 24 March 18:30 – 20:00
Join your peers at the High-brightness Congress Reception aboard the SS Armada as it takes a memorable cruise down the Danube, with nighttime views of the stunning cities of Buda and Pest. The reception is available for technical attendees with a EUR 10 reservation fee and EUR 65 for non-registered guests who wish to attend.
Tour of ELI ALPS
Saturday, 26 March 09:30 – 16:30
Join fellow High-brightness Congress attendees on an exclusive tour of the ELI ALPS facility. The day will start will an introductory talk in the conference hall, focusing on the science and experiments performed at ELI ALPS, followed by a guided tour of the facility where you will be introduced to the implemented research infrastructure, the main fields of research, and the special features of the building complex. The tour will conclude with lunch served on site at ELI ALPS. Transportation to and from the facility will be provided. The shuttle will depart the Kempinski Hotel Corvinus in Budapest at 09:30 and will return to the hotel at approximately 16:30.