High-Brightness Sources and Light-Driven Interactions Congress

 

Submission Deadline: 21 Dec 2021 12:00
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Compact (EUV and X-Ray) Light Sources (EUVXRAY)

Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals, and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources. Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening, and defense and security.

The aim of the Compact EUV and X-ray Light Source meeting is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities, and current and future application needs. At this meeting the latest results in the development of these sources will be presented as well as descriptions of efforts to mature the technology so that they meet the requirements needed in order to transition the technology to industrial and medical applications. Conference topics will include the latest development in source technologies and applications in the EUV through hard-ray regime.

The collocation with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MICS) meetings provides a unique opportunity to expand interaction with multidisciplinary groups that shares a broad range of interests and goal.

Topic Categories

  1. EUV through hard-x-ray sources and components
  • Compact sources
  • Compact Free-electron lasers
  • Inverse Compton scattering sources
  • Laser and discharge produced plasma sources
  • X-ray laser sources
  • High-harmonic generation sources
  • High power lasers beam diagnostics tools
  • Radio frequency cavities, and guns
  • Undulators and wigglers (including permanent magnet, short-period microwave and THz undulators, superconducting devices)
  • Magnets and multiband achromats
  • Vacuum chambers and components
  • Others
  1. Applications
  • EUV lithography and mask inspection
  • Semiconductor wafer inspection and metrology
  • Phase contrast imaging and tomography
  • Medical and clinical imaging
  • Biological imaging
  • Macromolecular crystallography
  • Cultural heritage studies
  • Non-destructive testing
  • Ultrafast and dynamic studies
  • Wide field imaging
  • Others
  1. Enabling technologies such as optics, detectors, beam wavefront diagnostic tools, and other instruments
     
  2. Data acquisition, management, and processing

Chairs

Lahsen Assoufid

Argonne National Laboratory, United States
Chair

Patrick Naulleau

Lawrence Berkeley National Laboratory, United States
Chair

Marie-Emmanuelle Couprie

Synchrotron SOLEIL, France
Program Chair

Tetsuya Ishikawa

RIKEN, Japan
Program Chair

Jorge Rocca

Colorado State University, United States
Program Chair

Committee Members

  • Lahsen Assoufid, Argonne National Laboratory, United StatesChair
  • Patrick Naulleau, Lawrence Berkeley National Laboratory, United StatesChair
  • Marie-Emmanuelle Couprie, Synchrotron SOLEIL, FranceProgram Chair
  • Tetsuya Ishikawa, RIKEN, JapanProgram Chair
  • Jorge Rocca, Colorado State University, United StatesProgram Chair
  • Igor Fomenkov, ASML US LP, United States
  • Federico Furch, Max Born Institute, Germany
  • Luca Giannessi, Elettra Sincrotrone Trieste, Italy
  • Debbie Gustafson, Energetiq Technology Inc, United States
  • Hans Hertz, Kungliga Tekniska Hogskolan, Sweden
  • Bob Hettel, Stanford University, United States
  • Dino Jaroszynski, University of Strathclyde, United Kingdom
  • Franz Kaertner, Universität Hamburg, Germany
  • Annie Klisnick, CNRS, France
  • Zhentang Zhao, Shanghai Institute of Applied Physics

Sponsors

Optica - Advancing optics and Photonics Worldwide