Compact EUV & X-Ray Light Sources (EUVXRAY)

Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources.

Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening and defense and security. The aim of the Compact EUV & X-Ray Light Sources Topical Meeting (EUVXRAY) is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities and current and future application needs. The latest results in the development of these sources are presented as well as descriptions of efforts to mature the technology so they meet the requirements needed in order to transition the technology to industrial and medical applications. Topics include the latest development in source technologies and applications in the EUV through hard-ray regime. The co-location with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MCS) Topical Meetings provides a unique opportunity to expand interaction with multidisciplinary groups that share a broad range of interests and goals.

Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening and defense and security.

The aim of the Compact EUV & X-Ray Light Sources Topical Meeting (EUVXRAY) is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities and current and future application needs. The latest results in the development of these sources are presented as well as descriptions of efforts to mature the technology so they meet the requirements needed in order to transition the technology to industrial and medical applications. Topics include the latest development in source technologies and applications in the EUV through hard-ray regime.

The co-location with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MCS) Topical Meetings provides a unique opportunity to expand interaction with multidisciplinary groups that share a broad range of interests and goals.

Committee

Lahsen Assoufid    
Argonne National Laboratory, USA

Patrick Naulleau
EUV Tech Inc, USA

Jorge Rocca
Colorado State Unuiversity, USA

Manasa Medikonda     
IBM, USA

Franz Kaertner
Universität Hamburg, Germany    

Marie Emmanuelle Couprie
Synchrotron Soleil, France

Luca Giannessi    
rmi, Sincrotrone Trieste, Italy

Federico Furch
Max Born Institute for Nonlinear, Germany

Wenbing Yun
Sigray,  USA

Myung Jun Lee
Samsung, Korea

Bruno Schueler    
Nova, USA

Hiromitsu Tomizawa    
RIKEN, Japan
 
Stephen Milton      
Tausystems, USA 

Don McDaniel    
Energetiq Technology, Inc, USA

François Légaré
INRS, Canada