Atomic Layer Deposition (ALD) offers a way to easily coat complex geometries with conformal and uniform optical coatings. This new method is making its way to the optical system designer’s toolbox, enabling use of new substrate formats such as tubes, highly curved lenses, domes, gratings, side walls etc.

In this webinar hosted by the OSA Thin Films Technical Group, Sami Sneck and John Rönn from Beneq will explain how the benefits of ALD can be utilized, and how the method can be made economical by using large batches or high deposition rate process. The webinar will cover several practical application examples utilizing the natural conformality of ALD in microscopic and macroscopic scale.

What You Will Learn:

• Principle, benefits, and limitations of Atomic Layer Deposition
• Practical applications of ALD for Optical Coatings

Who Should Attend:

• Optical coating engineers and scientists
• Engineers involved in development of optical coating equipment
• Scientists/engineers who designs optical systems and/or use coated optical components

About the Presenters: 

Sami Sneck, Beneq

Mr. Sneck, Business Executive at Beneq, joined Beneq in 2005. Since then, he has held various professional and management positions at Beneq, including Product Manager, Application Manager, Director of ALD group, Head of Sales and Head of Asia, in which position he spent 2 years in Shanghai, China. He received his MSc degree in Chemical Engineering in 2001 from Helsinki University of Technology. Mr. Sneck has special expertise in Atomic Layer Deposition technology and business development. He has played a vital role in introducing ALD production concepts and solutions to several industries ranging from jewelry to photovoltaics, optical coatings, and semiconductors.

John Rönn, Beneq

Dr. John Rönn is a process development engineer at Beneq and one of the leading researchers in atomic layer deposition solutions for optics and photonics. John received his Ph.D. from Aalto University School of Electrical Engineering in 2019. During his time in academia, John’s research focused on atomic-layer-deposited nanomaterials, and he has published scientific articles in very rigorous peer-reviewed journals, such as Nature Communications and ACS Photonics. John’s current work focuses on batch-production of critical optical coatings for both micro- and macrostructures using a variety of atomic-layer-deposited thin-film materials.