12 - 14 March, 2024
Hotel Savoyen Vienna
Vienna, Austria
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Compact EUV & X-Ray Light Sources (EUVXRAY)
Emerging, compact extreme-ultraviolet and x-ray sources that exhibit high brightness and are small enough to be installed in laboratories at educational and research institutions, manufacturing facilities, hospitals and other suitable sites, will revolutionize scientific and technical disciplines, complementing both existing and future large scale synchrotron radiation and free-electron laser sources.
Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening and defense and security. The aim of the Compact EUV & X-Ray Light Sources Topical Meeting (EUVXRAY) is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities and current and future application needs. The latest results in the development of these sources are presented as well as descriptions of efforts to mature the technology so they meet the requirements needed in order to transition the technology to industrial and medical applications. Topics include the latest development in source technologies and applications in the EUV through hard-ray regime. The co-location with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MCS) Topical Meetings provides a unique opportunity to expand interaction with multidisciplinary groups that share a broad range of interests and goals.
Applications span a wide range including biomedical, semiconductor manufacturing, fundamental and applied research, environmental engineering, industrial non-destructive testing and screening and defense and security.
The aim of the Compact EUV & X-Ray Light Sources Topical Meeting (EUVXRAY) is to assemble experts in both source technologies and their applications to present and exchange ideas and improve community wide understanding of current and future source capabilities and current and future application needs. The latest results in the development of these sources are presented as well as descriptions of efforts to mature the technology so they meet the requirements needed in order to transition the technology to industrial and medical applications. Topics include the latest development in source technologies and applications in the EUV through hard-ray regime.
The co-location with the High-Intensity Sources and High-Field Phenomena (HILAS) and Mid-infrared Coherent Sources (MCS) Topical Meetings provides a unique opportunity to expand interaction with multidisciplinary groups that share a broad range of interests and goals.
Chairs
Lahsen Assoufid
Argonne National Laboratory, United States,
Chair
Patrick Naulleau
Lawrence Berkeley National Laboratory, United States,
Chair
Franz Kaertner
Deutsches Elektronen Synchrotron, Germany,
Program Chair
Manasa Medikonda
IBM TJ Watson Research Center, United States,
Program Chair
Jorge Rocca
Colorado State University, United States,
Program Chair
Committee Members
- Lahsen Assoufid, Argonne National Laboratory, United States, Chair
- Patrick Naulleau, Lawrence Berkeley National Laboratory, United States, Chair
- Franz Kaertner, Deutsches Elektronen Synchrotron, Germany, Program Chair
- Manasa Medikonda, IBM TJ Watson Research Center, United States, Program Chair
- Jorge Rocca, Colorado State University, United States, Program Chair
- Christelle Bruni, UNIVERSITE PARIS-SUD, France
- Marie-Emmanuelle Couprie, Synchrotron SOLEIL, France
- Federico Furch, Max Born Institute, Germany
- Luca Giannessi, Elettra Sincrotrone Trieste, Italy
- Bob Hettel, SLAC National Accelerator Laboratory, United States
- Myungjun Lee, SAMSUNG, United States
- François Légaré, INRS-Energie Mat & Tele Site Varennes, Canada
- Peter Mayer, ASML, United States
- Don McDaniel, Energetiq Technology Inc, United States
- Stephen Milton, Tau Systems, United States
- Bruno Schueler, Nova Measuring, United States
- Hiromitsu Tomizawa, RIKEN, Japan
- Assunta Vigilante, Rigaku Europe SE, Germany
- Wenbing Yun, Sigray Inc., United States