10 November 2016

The Optical Society Announces 2017 Fellows Class

WASHINGTON – The Optical Society (OSA) Board of Directors is pleased to announce that 96 OSA members, representing 19 different countries, have been elected as the newest class of OSA Fellows. This year, the OSA Fellows Committee reviewed 177 nominations. Fellows are selected based on several factors, including specific scientific, engineering, educational and technological contributions, technical or industry leadership in the field as well as service to OSA and the global optics community. As a reflection of The Optical Society’s global reach, 60 percent of this year’s newly elected Fellows reside outside the United States.
“Heartiest congratulations to the 2017 OSA Fellows, who are excellent examples of optics and photonics innovators and will be outstanding representatives of The Optical Society,” said Alan Willner, 2016 President of The Optical Society and Steven & Kathryn Sample Chair in Engineering, University of Southern California, California, USA. “The new Fellows join an illustrious group who have collectively had great impact on our field and society at large.”
Fellows of The Optical Society are members who have served with distinction in the advancement of optics and photonics. The OSA Fellow Members Committee reviews nominations submitted by current OSA Fellows, then recommends candidates to the OSA Awards Committee and OSA Board of Directors. No more than 10 percent of the total OSA membership may be chosen as Fellows, making the process both highly selective and competitive.
“Thank you to Fellows Committee Chair Edward Watson and the rest of the committee for their time and focus in reviewing the record number of submissions received this year,” said Elizabeth Rogan, CEO, The Optical Society. “The 2017 Fellows reflect a diverse group of OSA members who are leaders in optics and photonics. It’s an honor to recognize the 2017 OSA Fellows class for their accomplishments, achievements and continued contributions to our industry.”  
The new Fellows will be honored at OSA conferences and meetings throughout 2017. A listing of all 96 new Fellows appears below:
2017 OSA Fellow Members 
  • Ayman Abouraddy, CREOL, The College of Optics & Photonics, University of Central Florida, United States
  • Samuel Achilefu, Washington University in St Louis, United States
  • Stefan Andersson-Engels, Tyndall National Institute, Ireland
  • Brian Applegate, Texas A&M University, United States
  • Craig Arnold, Princeton University, United States
  • Roel G.F. Baets, Ghent University– IMEC, Belgium
  • Raymond G. Beausoleil, Hewlett Packard Labs, United States
  • Marco Bellini, Istituto Nazionale di Ottica (CNR), Italy
  • Wengang (Wayne) Bi, Hebei University of Technology, China
  • Gabriella Bosco, Politecnico di Torino, Italy
  • Walter F. Buell, The Aerospace Corporation, United States
  • Gerald S. Buller, Heriot-Watt University, United Kingdom
  • John Canning, University of Sydney & University of Technology interdisciplinary Photonics Laboratories (iPL), Australia
  • Adrian Carter, Nufern, Australia
  • Yijiang Chen, Jet Propulsion Laboratory, United States
  • Majed Chergui, Ecole Polytechnique Fédérale de Lausanne, Switzerland
  • Aref Chowdhury, Nokia Corporation, United States
  • Wallace Chik-Ho Choy, The University of Hong Kong, Hong Kong
  • Costantino De Angelis, University of Brescia, Italy
  • Johannes Fitzgerald de Boer, Vrije Universiteit, Amsterdam, Netherlands
  • Peter de Groot, Zygo Corporation, United States
  • John J. Degnan, Sigma Space Corp, United States
  • Ivan B. Djordjevic, University of Arizona, United States
  • Po Dong, Nokia Bell Labs, United States
  • Andrea C. Ferrari, University of Cambridge, United Kingdom
  • Andrew Forbes, University of Witwatersrand, South Africa
  • Victor L. Gamiz, US Air Force Research Laboratory, United States
  • Javier Garcia-Monreal, Universitat de Valencia, Spain
  • Debabrata Goswami, Indian Institute of Technology, Kanpur, India
  • Shekhar Guha, US Air Force Research Laboratory, United States
  • Robert H Hadfield, University of Glasgow, United Kingdom
  • David W. Hahn, University of Florida, United States
  • Jung Han, Yale University, United States
  • Jeff Hecht, Hecht Associates, United States
  • Stefan W. Hell, Max Planck Institute for Biophysical Chemistry, Germany
  • Richard B Holmes, Boeing Company, United States
  • JianJang Huang, National Taiwan University, Taiwan
  • Stephen Hughes, Queen's University at Kingston, Canada
  • Tetsuya Ishikawa, RIKEN, Japan
  • Wei Jin, Hong Kong Polytechnic University, China
  • Deborah M. Kane, Macquarie University, Australia
  • Ajoy Kumar Kar, Heriot-Watt University, United Kingdom
  • Guoqiang Li, The Ohio State University, United States
  • Dale C. Linne von Berg, US Naval Research Laboratory, United States
  • Hong Liu, Google, United States
  • Xu Liu, Zhejiang University, China
  • Chao Lu, Hong Kong Polytechnic University, Hong Kong
  • Chao-Yang Lu, University of Science and Technology of China, China
  • Olivier J.F. Martin, Swiss Federal Institute of Technology Lausanne (EPFL), Switzerland
  • Manuel Martinez-Corral, Universitat de Valencia, Spain
  • Rosario Martinez-Herrero, Universidad Complutense de Madrid, Spain
  • Manyalibo J. Matthews, Lawrence Livermore National Laboratory, United States
  • Noureddine Melikechi, University of Massachusetts Lowell, United States
  • Rajesh Menon, University of Utah, United States
  • Ignacio Moreno, Universidad Miguel Hernandez de Elche, Spain
  • N. Asger Mortensen, The University of Southern Denmark, Denmark
  • Thomas E. Murphy, University of Maryland at College Park, United States
  • Jeffrey W Nicholson, OFS Laboratories, United States
  • Zhe-Yu Jeff Ou, Indiana University-Purdue University Indianapolis, United States
  • Sharathchandra Pankanti, IBM TJ Watson Research Center, United States
  • Rüdiger Paschotta, RP Photonics Consulting GmbH, Germany
  • Keith Paulsen, Dartmouth College, United States
  • Anna C. Peacock, University of Southampton, United Kingdom
  • Paul C. M. Planken, Advanced Research Center for Nanolithography (ARCNL), and Institute of Physics, University of Amsterdam, Netherlands
  • Albert Polman, FOM Institute for Atomic and Molecular Physics, Netherlands
  • Michelle Lynn Povinelli, University of Southern California, United States
  • Malin Premaratne, Monash University, Australia
  • Frederick J Raab, LIGO Hanford Observatory, United States
  • Ann Roberts, University of Melbourne, Australia
  • Leslie A. Rusch, Universite Laval, Canada
  • Peeter Saari, University of Tartu, Estonia
  • Seb Savory, University of Cambridge, United Kingdom
  • Jacob Scheuer, Tel-Aviv University, Israel
  • John Sheridan, University College Dublin, Ireland
  • Jinn-Kong Sheu, National Cheng Kung University, Taiwan
  • Perry Ping Shum, Nanyang Technological University, Singapore
  • Peter T. C. So, Massachusetts Institute of Technology, United States
  • David E. Spence, Spectra-Physics, United States
  • Sarun Sumriddetchkajorn, National Electronics and Computer Technology Center (NECTEC), Thailand
  • Xiao Wei Sun, Southern University of Science and Technology (SUSTech), China
  • Peter Zoltan Takacs, Brookhaven National Laboratory, United States
  • Paola Taroni, Politecnico di Milano, Italy
  • Jie Tian, Key Laboratory of Molecular Imaging, Chinese Academy of Sciences, China
  • John W. G. Tisch, Imperial College London, United Kingdom
  • Tomasz S. Tkaczyk, Rice University, United States
  • Shoji Tominaga, Chiba University, Japan
  • Kathleen Tse, AT&T Corp, United States
  • Zhiyi Wei, Institute of Physics, Chinese Academy of Sciences (CAS), China
  • Howard Wiseman, Griffith University, Australia
  • Shinji Yamashita, RCAST, The University of Tokyo, Japan
  • Lianshan Yan, Southwest Jiaotong University, China
  • Lan Yang, Washington University in St Louis, United States
  • Xinliang Zhang, Huazhong University of Science and Technology, China
  • Zhigang Zhang, Peking University, China
  • Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics, China
  • Rashid Zia, Brown University, United States
About The Optical Society
Founded in 1916, The Optical Society (OSA) is the leading professional organization for scientists, engineers, students and business leaders who fuel discoveries, shape real-life applications and accelerate achievements in the science of light. Through world-renowned publications, meetings and membership initiatives, OSA provides quality research, inspired interactions and dedicated resources for its extensive global network of optics and photonics experts. For more information, visit osa.org/100.